Heidelberg Instruments Inc.

Zurich, Switzerland/Heidelberg, Germany — Heidelberg Instruments proudly announces the launch of its new NanoFrazor nanolithography system, advancing decades of expertise in micro- and nanofabrication. This versatile tool, designed for high resolution, flexibility, throughput and modularity, can be equipped with ten parallel patterning cantilevers, significantly boosting productivity. Combining Thermal Scanning Probe Lithography (t-SPL), Direct Laser Sublimation (DLS), and enhanced automation, the NanoFrazor supports cutting-edge research in quantum devices, 1D/2D materials, and nanoscale electronics, as well as applications in nanophononics, meta-optics, and nano fluidics. At the heart of the NanoFrazor is an ultrasharp, heat able probe tip, enabling precise patterning of nanostructures with lateral resolutions as fine as 15 nm and vertical resolutions down to 2 nm. Its in-situ inspection system offers Closed-Loop Lithography (CLL), allowing for marker less overlay and real-time adjustments to ensure sub-2 nm vertical precision for even the most complex grayscale patterns. This groundbreaking feature enables advanced applications in photonics, biomimetic substrates, and local material modification through heat-induced chemical reactions or phase changes. Key Features: • Thermal Scanning Probe Lithography (t-SPL): High-precision patterning for critical nanodevice components. • Modularity: The NanoFrazor’s configurable platform allows for tailored solutions based on application and lab requirements. Additional modules and upgrades can be installed as research progresses, offering flexibility and scalability. • Resolution & Throughput: With the new Decapede module, throughput is increased tenfold by utilizing 10 independent thermal cantilevers, delivering speed without sacrificing resolution. • Hybrid Mix & Match Lithography: The NanoFrazor supports a Direct Laser Sublimation (DLS) module for faster micrometer-resolution writing, making it ideal for large-area patterns like contact wires and pads. Building on decades of R&D originating at IBM Research Zürich, the NanoFrazor continues to evolve at Heidelberg Instruments Nano. A comprehensive library of best practices in etching, lift-off, and other processes ensures that users can optimize their results across various applications. For more information, visit our recent blog post: NanoFrazor - A New Generation of Thermal Scanning Probe Lithography (heidelberg-instruments.com) Contact Heidelberg Instruments Mikrotechnik GmbH via the contact page at www.heidelberg-instruments.com/

We are thrilled to our groundbreaking product, the MPO 100! This Two-Photon Polymerization (TPP) Multi-User Tool is to revolutionize 3D lithography and microprinting in the realms of micro-optics, photonics, micromechanics, and biomedical engineering. Key Features of MPO 100: Modular 3D Printing Platform: MPO 100 delivers high precision on demand for 3D lithography and a substantial print volume for 3D microprinting, facilitating the production of intricate functional microstructures with unparalleled throughput in a single process step. Femtosecond Laser System: Equipped with a powerful femtosecond laser system operating at 522 nm, the MPO 100 ensures efficient and high-speed processing of a wide range of commercially available polymer systems. Notably, it excels in handling ORMOCER®, a proven inorganic-organic hybrid polymer renowned for its exceptional optical, mechanical, and chemical properties. Material Innovation: The MPO 100 serves as an ideal tool for R&D endeavors, enabling the development of new material systems. Its 522 nm TPP wavelength enhances sensitivity, making it a versatile platform for the exploration and advancement of cutting-edge photoresists. This innovation represents a significant leap forward in 3D lithography and microprinting technology, offering our valued users unparalleled capabilities for pushing the boundaries of what's possible in microstructure fabrication. We invite you to explore the endless possibilities with the MPO 100 and witness firsthand the seamless integration of precision, speed, and material versatility in a single, user-friendly solution.

Heidelberg, Germany—Heidelberg Instruments, a world-leading provider of advanced laser lithography systems, is pleased to announce a continued stream of orders for the ULTRA Semiconductor Mask Writer from photomask production groups across the US and Asia. This sustained demand highlights the company's commitment to delivering high-quality, reliable technology that meets evolving customer needs. Since launching its first ULTRA system six years ago, the company has consistently refined and advanced its technology to meet the increasing demands of semiconductor manufacturers worldwide. The ULTRA Semiconductor Mask Writer is specifically designed to create photomasks essential for fabricating a wide range of electronic devices, including microcontrollers, power management systems, LEDs, Internet of Things (IoT) devices, MEMS, and cutting-edge Artificial Intelligence (AI) applications. Key advantages of the ULTRA include: • Cost-Effective Solution with High Precision and Accuracy: The ULTRA can produce structure sizes as small as 500 nm while maintaining excellent critical dimension uniformity and superior image quality. • Efficient Production: With write speeds of up to 580 mm² per minute, the ULTRA ensures efficient and reliable mask production. • Seamless Integration: Its compact design allows easy integration into existing mask shop infrastructures, making it an ideal choice for semiconductor manufacturers looking to expand or upgrade their capabilities. • Advanced Features: The standard configuration includes fully automatic mask handling, a Zerodur® stage, low distortion optics, and high-precision position control, ensuring top-level performance and reliability. Looking ahead, the future of semiconductor photomask production is set for significant growth, driven by expanding applications in industries ranging from consumer electronics to automotive and industrial sectors. Heidelberg Instruments remains committed to leading the way with innovative solutions like the ULTRA, helping customers navigate the challenges and opportunities in this dynamic industry. For more information about the ULTRA Semiconductor Mask Writer, please visit https://heidelberg-instruments.com/product/ultra-semiconductor-mask-writer/ Contact Heidelberg Instruments Mikrotechnik GmbH via the contact page at www.heidelberg-instruments.com/

Heidelberg, Germany – Heidelberg Instruments has secured two major orders for its VPG+ 1400 FPD Volume Pattern Generator from leading photomask manufacturers in Asia, with a total order value between EUR 9 million and EUR 10 million. Deliveries are scheduled for 2025. “These significant order intakes mark major milestones for the company, reinforcing our market position and driving further innovation and growth in the display technology sector”, says Alexander Forozan, VP of Global Sales and Business Development. The VPG+ 1400 is Heidelberg Instruments’ largest system, specifically designed for large-format photomask patterning in the flat panel display (FPD) industry. It supports mask sizes up to 1400 x 1400 mm², making it ideal for various flat panel display generations (G4 to G8). The VPG+ 1400 sets a new standard for high-throughput photomask production, offering the precision and scalability required for large displays. Additionally, it delivers the accuracy needed to produce large-area halftone photomasks for flat panel displays. Equipped with advanced metrology and alignment features, including Cognex AI-based image recognition, the system ensures precise alignment for multilayered masks. Its linear and nonlinear coordinate corrections further enable precise overlay across tools. By addressing the diverse exposure needs of customers, Heidelberg Instruments' large-area VPG+ Volume Pattern Generators have proven to be valuable assets in display photomask production lines. Further information: https:// https://heidelberg-instruments.com/product/vpg-1400-fpd/